Description
The Ultrafast Nanoscience Group supports internal and user research by providing nanofabrication and characterization at nanoscale.
Nanolithography is based on an Electron Beam Lithography (EBL) system. Metallic nanostructure arrays for plasmonic applications [1] or electrodes allowing for light field–controlled PHz currents in dielectrics, semiconductors [2] and metals [3] were manufactured.
The Focused Ion Beam device applies Ga ions for the direct writing of nanopatterns, such as grating couplers for probing of hot electron excitations [4], the milling of thin film cross-sections for the detection of e.g. embedded golden NPs in cellulose [5].
Scanning scattering near-field microscope maps optical near fields in different excitation geometries with nanometric resolution. Chiral light-matter interaction was visualised on nanostructures [6]. Ongoing user projects aim at exploring exciton polaritons in perovskites, and carbon nanotube conductivity [7].
Pump-probe ellipsometry is used for the investigation of ultrafast processes. The setup built at ELI-ALPS is based on ∼10-fs laser pulses centered at 810 nm. The time resolution is ∼20-fs, and the lateral resolution is ~20 m. We demonstrated the system performance by measuring ultrafast electron intervalley scattering and hole dynamics in Ge [8].
[1] Z. Pápa et al. APL, 120 (5) 053103
[2] V. Hanus Optica 8, 4, 570 (2021).
[3] B. Fehér et. al. SciAdv 11, (2025) https://doi.org/10.1126/sciadv.adv5406
[4] P. Sándor et al. Nano Lett. 2024, 24, 26, 8024–8029
[5] M. Mustapić et al. Mater. Adv. 7, 2, 798-812 (2026)
[6] L. Tóth et al. Nanophotonics, (accepted 2026)
[7] K. Kamaras et al. presentation at the 2024 MRS Fall Meeting & Exhibit, Boston, MA, USA, Dec. 3, 2024, Paper No. NM01.
[8] A. Gera et al. PRB (accepted 2026)
